Professional developer for photo varnishes and positive plates, photopolymer chemistry, exposure reagent, for PCB plates, for UV printing, fast development, high resolution
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Product description
The universal developer for photoresists and positive plates is a professional reagent for exposure processes, ensuring clear and sharp contours even on the most precise PCB designs.
Advantages and Unique Features
- Clear, sharp contours even on fine patterns
- NaOH-free formula—safe for skin and substrates
- Easy preparation and use—water-soluble powder
- Versatile applications in PCB fabrication, microlithography, and technical photography
- Consistent quality and repeatable results
Properties and Applications
- Sharp contours: ideal for precision electronic circuits and printed circuit boards
- NaOH-free: minimizes risk of damage to delicate photoresist coatings
- Versatility: suitable for microlithography and technical photography processes
- Simple application: prepare solution in 50 °C water and develop in 30–60 s
Technical Specifications
| Parameter | Value |
|---|---|
| Appearance | White fine crystalline powder |
| Bulk density | ~0.85 g/cm³ |
| Melting point | ~72.2 °C |
| Solution pH | 12–13 |
| Whiteness | min. 80 % |
| Iron (Fe) | max. 100 ppm |
| Na₂O content | 28.5–30 % |
| SiO₂ content | 27.8–29.25 % |
| Water-insoluble substances | max. 0.05 % |
| Shelf life | 3 years |
Storage Recommendations
Store in tightly sealed containers in a cool, dry, well-ventilated area, away from heat sources and ignition. Avoid contact with acids, oxidizers, and metals, and protect from moisture.
Product safety
Manufacturer
AG TermoPasty
ul. Kolejowa 33E
18-218 Sokoły, Poland
Responsible person in the EU
AG TermoPasty
ul. Kolejowa 33E
18-218 Sokoły, Poland
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